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Technical Description
OC-3 oxidation catalyst can be used for removing impurities such as CH₄, H₂, CO, and light hydrocarbons from oxygen or oxygen-containing inert gases. It features high strength, excellent activity, high removal efficiency, superior thermal stability, long service life, and low operating temperature.

Patent Number
201811474087.0

Working Principle
H₂ + O₂ → H₂O;
CO + O₂ → CO₂
CmHn + O₂ → CO₂ + H₂O;
CmHnOK + O₂ → CO₂ + H₂O

Application Areas
This product is mainly applied in petrochemicals, metallurgy, semiconductor electronics, air separation krypton-xenon gases, and other fields for the removal of trace impurities such as CH₄, H₂, CO, and light hydrocarbons from gases.

Typical Projects
◆ Shanghai Qiyuan Air Separation Development Co., Ltd.
◆ Hanmo Energy Technology (Shanghai) Co., Ltd.
◆ Henan Zhongke Fuji Technology Co., Ltd.
◆ Hangzhou Zhongtai Cryogenic Technology Corporation
◆ Zhejiang Xinrui Air Separation Plant Co., Ltd.
◆ Shanghai Padik Semiconductor Materials Co., Ltd.
◆ Linde Gases Co., Ltd.

Technical Specifications